Journées Nationales de la Lithographie par NanoImpression

JNIL 2025, 05 et 06 Juin 2025, LAAS, Toulouse

Logo LTM
Logo LPCNO
Logo LAAS
Logo INL
Logo CEA
Logo CNRS
Logo Renatech
Logo C2N
Logo SOLNIL
Logo LHC

Thursday 05/06

Time Event
12h30 - 13h30Welcoming the JNIL participants
13h30 - 14h00Welcome speech : Mohamed KAÂNICHE, LAAS Director
Jean-Louis LECLERCQ, Renatech Director
14h00 - 14h45PLENARY SESSION>Prof. Stephen Y. Chou
Department of Electrical and Computer Engineering
Princeton University, Princeton NJ, USA
"30 Years of Nanoimprint: A Transformative Technology Revolutionizing Research, Nanomanufacturing, and Industry"
14h45 - 15h00Trong Tam Nguyen - INL - Dual resonances to enhance two-photon absorption and strong-coupling effect in Perovskite-based metasurfaces
15h00 - 15h15Etienne Palleau - LPCNO - Twisted NIL like processes applied to colloidal nanoparticle patterning for secured micro/nanotagging solutions and microdisplay applications
15h15 - 15h30Loukiana KOZLOV - IPVF, C2N - Using Nano-Imprint Lithography for ultrathin CIGS Solar Cells as a passivating and light trapping solution
15h30 - 15h45Huiru Ren - INL - Soft Nanoimprinting of Nanostructures with Optimized TiO₂ Sol Gel
15h45 - 16h00Industrial Talk : EDEN TECH
16h00 - 16h15Industrial Talk : Bruker
16h15 - 16h30Industrial Talk : Microlight3D
16h30 - 16h45Coffee break
16h45 - 17h30INVITED TALK
Jürgen Brugger, EPFL – Institute of Microengineering
"Direct cutting and grayscale patterning usingnthermo-mechanical nanotools"
17h30 - 17h45Yoann Blancquaert - CEA LETI - Metrology overlay techniques for Nano Imprint Lithography
17h45 - 18h00Sarah Douri - LNE - Development of a new hybrid approach combining AFM and SEM for dimensional metrology of nanoparticles
18h00 - 18h15Industrial talk : MICRO RESIST
"Advanced Nanoimprint Materials enabling High Performance Applications"
18h15 - 19h00Poster session and Industrial exhibition
19h30 - Dinner Gala
ATRIUM Restaurant
7, Place du Capitole,
TOULOUSE

Friday 06/06

Time Event
8h30 - 9h15 INVITED Talk
Nikos Kehagias
, Researcher, Scientific technical advisor @ Nanotypos
"Adaptable meta surfaces via alternative nano-manufacturing techniques"
9h15 - 9h30 V. Saranathan - IRBI - Biomimetics of biological mesoscopic patterning
9h30 - 9h45 Jérôme RECHE - CEA LETI - High-resolution 3D patterning through the combination of g-EBL and soft-UV NIL.
9h45 - 10h00 David Grosso - SOLNIL - Metal oxide metasurfaces elaborated by nanoimprint and derived methods
10h00 - 10h30 Coffee break
10h30 - 12h30 NIL workshop sessions (upon registration)
1/ NanoNex equipment demo
2/ Getting around NIL techniques and soft lithography with table top equipments
12h30 Closing of the congress - Award ceremony (poster session)
12h45 - Lunch & discussions

Bruker
Eden Tech
Evident

GDR µfluidique
microlight3D
FERMaT

NanoX
Renatech
Scientec

SET
Silsef
essilor

Solnil
Micro Resist