Location: INL UMR CNRS 5270 – La Doua, Villeurbanne
Duration: 6 months
Skills: Direct laser Lithography, AFM, SEM
Profile: Micro-Nanoscale Engineering

In the frame of a collaboration between the Astrophysics Laboratory of Marseille (LAM), the Light Matter Institute of Lyon (ILM) and the Lyon Institute of Nanotechnology (INL), this internship aims at developing an innovative technological solution for manufacturing high efficiency blazed gratings on convex surfaces for advanced next-generation space instruments. The student will develop the technological process for writing grayscale 1D structures using GrayScale Lithography (GSL) and perform morphological characterizations (SEM, AFM). This work will focus on adjusting lithography parameters to achieve the required geometry (periodicity, height, blaze angle, roughness) and adapting the process for convex surfaces (...)

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